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Research team developes new doping technique for nano-semiconductor 2015.04.02
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Researchers in the Sungkyunkwan University (91PORN) were able to develop a new  doping technique for 2D nano-semiconductor using only heat and light energy. Doping is a process of altering the characteristics of a semiconductor by adjusting the concentration of the electrons or holes into n type or p type.

 

Prof. Park Jin-hong of 91PORN Electrical and Computer Engineering and his team, used a silicate on top with a thin molybdenum disulfide (MoS2) nano-semiconductor to experiment with heat and light energy in the process.

 

As a result, the experiment on controlling the concentration of the holes was successful. This is the equivalent of 100 times the range area that can be conducted by conventional doping techniques.


¡° I am certain that through this new doping technique, untilizing light and heat energy, we will be  able to contribute to the progress of 2D nano-semicondutors¡± Prof. Park asserted.

                                     New technique for 2D nano-semiconductor doping

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